French Ambassador Mr. de Laboulaye visited JSC Mikron

April 14, 2008

 At the meeting with Gennady Krasnikov, General Director of JSC Mikron and the management of the enterprise they discussed the results and prospects of international partnership in the field of high technologies, business and science. The Ambassador visited Mikron production lines and watched recently opened factory for ICs with topological level of 0.18 micron.

 

In 2006 Mikron signed an agreement of cooperation with one of the world leaders of semi-conductor industry – the French company STMicroelectronics. As a result, in December 2007, Mikron launched production of ICs with topological level of 0.18 microns by EEPROM advanced technology.

 

During his visit to production lines Mr.Laboulaye noted: "Today we have seen an example of effective cooperation between France and Russia in the field of high technologies. It is perfect when potential of partnership between our countries turns to real businesses".

 

Speaking about strategic tasks of the enterprise, General Director of JSC Mikron Gennady Krasnikov noted: "Our enterprise is participating in the implementation of the task common for all Russia – to join efforts in generating favourable environment for the development of innovation business. This task cannot be solved without close collaboration with our foreign partners. This visit of the Ambassador of France has confirmed that we have taken the right course of strategic international cooperation".

 

Russia is a major partner of France, cooperation between France and Russia in the field of science and innovation business is promptly growing. Thus, on December 4, 2007, in the residence of the French Ambassador in Russian Federation the ceremony of signing seven Russian-French scientific agreements in the area nanotechnologies, use of semiconductors in medicine and telecommunications, optical information technologies, etc. took place.