History of the company

History

2007

In April JSC Mikron together with the Russian Managers Association (www.arm.ru) held the First International Conference on Microelectronics.

In April SITRONICS Microelectronic Solutions became the member of international association EUROSMART. This association represents interests of manufacturers of smart-cards, semiconductors, terminals and equipment for integration of smart-card systems applied in the most different spheres - electronic passports, payment cards, medical cards, some other applications.

In September it entered international semi-conductor trade association - GSA (Global Semiconductor Association), www.gsaglobal.org

On December 12, JSC Mikron started production of microcircuits with topological level of 0.18 microns by EEPROM technology.

2006

In March JSC Sitronic Smart Technologies, one of the 4 companies within the framework of business - division "SITRONICS Microelectronic Solutions", started production of SIM-cards.

In July there was signed an agreement with STMicroelectronics company on the transfer of "know-how" for production of ICs with topological level of 0.18 microns by EEPROM technology to JSC Mikron.

In August JSC Mikron launched production of chip - modules for contact smart-cards.

On October 17, Vladimir Putin, President of Russia, presided over the session of the RF President’s Council for science, technology and education that was held at Mikron.

In November JSC Mikron distributed the rules of ICs design by 0.18 micron EEPROM technology available for Russian design - centers.

In December JSC Mikron launched a complete cycle of production of RFID-tickets for transport systems and started tickets supplies for the Moscow Metro.

2001-2005

By the decision of Russian Federation Government JSC Mikron was awarded the Premium of RF Government for the achievements in quality upgrading;

In 2001 on The First Moscow International Salon for Innovations and Investments JSC Mikron was awarded two gold and two silver medals for the development of new technological routes; Design and production technology were developed and the first samples of micromechanical optical fiber switch were made;

JSC Mikron was the first among all industrial enterprises of the country to enter the share market, it was in 2002;

A brand-new Design Centre was opened in 2005;

An assembly line of liquid crystal monitors components was launched in 2005;

In 2001 JSC Mikron was integrated into the structure of high-tech holding "Centre of Science" Concern (later it was Concern Sitronics).

JSC Mikron is the main enterprise of "Microelectronic Components" division of Concern Sitronics.

1996 - 2000

High-speed DAC and ADC circuits of 572 series were developed and applied;

Production of more than 200 types of integrated circuits manufactured previously on other enterprises of the country was launched;

A new clean room was constructed and production of IC on silicon wafers 150 mm diameter (4 inches) with design norms of 0.8 microns was launched;

In 1999 JSC Mikron received an international certificate of Bureau Veritas Quality International on the conformity of the quality control system to ISO 9000 standards;

In 2000 JSC VZPP-Mikron was founded on the basis of Voronezh Factory of Semiconductors.

1991 - 1995

The installation of Class 10 clean room "Ozon-1" on the basis of domestic components was completed in1991;

In 1991 a pilot sample of the colour 100 mm liquid crystal display was developed;

JSC Mikron was given the right to come out independently on the foreign markets.

The serial supplies of IC crystals for Samsung company began;

On January 13, 1994, Moscow registration chamber registered the enterprise as a joint-stock company of the open type Scientific Research Institute of Molecular Electronics and factory Mikron – JSC Mikron in short;

BiCMOS IC technology was developed;

Element base of modern BiCMOS IC with the use of self-combined technology was created (protected by 7 patents of the Russian Federation).

1986-1990

The first IC with programmed logic matrixes of 556 and 1556 series were manufactured;

The industrial production of BMC-I-300B base matrix crystal with the speed of 0.35 ns on the gate, 1500 gates on the crystal to become the element base of domestic super computers was launched;

Domestic super-combined technology (SCT) for production of bipolar transistors with high degree of integration and the speed of 0.15 ns on the gate was developed;

The first circuits of PAL family, television IC were mastered.

1978-1985

Universal high-speed microprocessor set of 1802 series, intended for defense industry, in particular for AAD complexes, was developed;

In 1980 "Mikron" factory produced its 100s-million microcircuit;

Deliveries of integrated microcircuits for the program "Mars - Venus" were made;

Production of CMOS RAMs began;

Production on the basis of domestic clean rooms was launched at the enterprise.

1976-1977

In 1977 for the first time in the country a set of microprocessor LSIC TTL with Shottky diodes was developed;

The first domestic technical process of IC production with oxide insulation ("isoplanar") – the basis for production of bipolar IC of the subsequent generation was elaborated, 1977;

Basic technological process of manufacturing IC with application of ion alloying was developed and introduced;

Plasma chemical processes were introduced in the technology of IC production.

1971-1975

In 1971 all four sections of "Mikroní" factory of the total area exceeding 60 thousand sq.m. were ready for mounting;

For the first time in the industry the microcircuit of 155 series was certificated for the highest category of quality and was awarded "The Mark of Quality", 1972.

Industrial production of the logic digital IC of 100 and 500 series with the speed 2 ns on the gate developed at the enterprise was launched which provided element base for:

- Super-large mainframe "Elbrus - 2" and "Ryad" machine intended for handling strategic tasks of the national economy, world ecology and defense,

- Uniform mainframe system used in the national economy of COMECON countries,

- "Bulat" mainframe - special machines for defense system.

NIIME and Mikron, 1966-1970

JSC Mikron was set up on February 1, 1967 by the order of the USSR Minister of electronic industry as the factory for integrated circuits.

The volume of production in 1966 amounted to 100 000 microcircuits.

For the first time in the country the following technology and products were developed and manufactured:

- Planar technology As-Ga microcircuits;

- Plastic case for IC and press composition;

- IC crystals of emitter-coupled logic (ECL);

- Digital transistor-transistor logic (TTL) and analog IC for consumer application.

By 1970 more than 3.5 mln. ICs were made and delivered to various branches.

Foundation of Scientific Research Institute for Molecular Electronics

1964 – By the Order of the USSR State committee for electronic engineering № 50 as of March 9, Scietific Research Institute for Molecular Electronics (NIIME) was founded.

On January 25, 1965, K.A.Valiev was nominated the director of NIIME.

By the beginning of the year Scietific Research Institute for Molecular Electronics had 183 employees. The majority of the employees were working in the main hall of Elion factory.

On Komponent factory the first production line for planar bipolar n-p-n chip transistors was mounted and launched.

At the end of 1965 the construction of NIIME building by the area of 25,000 sq.m was completed.